Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same

Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same

US Patent 8236382 · Granted Aug 7, 2012

Estimated economic value: $20,329,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Vapor cleaning of substrate surfaces2025
Isotropic silicon nitride removal2025
Use of vacuum during transfer of substrates2025
Method and apparatus for processing wafer-shaped articles2020
Germanium etching systems and methods2020
Method and apparatus for processing wafer-shaped articles2019
Methods for selective etching of a silicon material using HF gas without nitroge2019
Method for fabricating junctions and spacers for horizontal gate all around devi2019
Germanium etching systems and methods2018
Self-limiting atomic thermal etching systems and methods2018
Self-aligned shielding of silicon oxide2018
Self-aligned shielding of silicon oxide2018