Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-limiting atomic thermal etching systems and methods

Self-limiting atomic thermal etching systems and methods

US Patent 10043684 · Granted Aug 7, 2018

Estimated economic value: $22,921,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Halogen resistant coatings and methods of making and using thereof2025
Self-aligned wide backside power rail contacts to multiple transistor sources2025
High quality quantum computer components2025
Selective etching between silicon-and-germanium-containing materials with varyin2025
Semiconductor chamber components with advanced dual layer nickel-containing coat2025
Selective etching of silicon-and-germanium-containing materials with increased s2025
Methodology for coating non-conducting articles with broad-spectrum antimicrobia2025
Low temperature graphene growth2025
Multi color stack for self aligned dual pattern formation for multi purpose devi2025
Deposition of silicon-based dielectric films2025
Deposition of silicon-based dielectric films2025
Methods for removing etch stop layers2025