Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Atomic layer deposition apparatus

Atomic layer deposition apparatus

US Patent 8027746 · Granted Sep 27, 2011

Estimated economic value: $17,577,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for low temperature selective epitaxy in a deep trench2025
Image interaction using sound signals2024
Printing a chemical mechanical polishing pad2024
Selective cobalt deposition on copper surfaces2024
Low temperature deposition of iridium containing films2024
Systems and methods for making solar panels or components thereof2024
Systems and methods for making solar panels or components thereof2024
Selective etch process using hydrofluoric acid and ozone gases2023
Methods for the treatment of workpieces2023
Printing a chemical mechanical polishing pad2023
Method of utilizing a degassing chamber to reduce arsenic outgassing following d2023
Low temperature deposition of iridium containing films2023