Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Selective etch process using hydrofluoric acid and ozone gases

Selective etch process using hydrofluoric acid and ozone gases

US Patent 11791166 · Granted Oct 17, 2023

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods for mapping personalized translatome2025
Organic light emitting material2025
Systems and methods for thermal processing and temperature measurement of a work2025
Transmission-based temperature measurement of a workpiece in a thermal processin2025
Display panel bonding device and correction apparatus2025
Hybrid computing system management2025
Zonal lenses for a head-mounted display (HMD) device2025
Index-gradient structures with nanovoided materials and corresponding systems an2025
Thermophilic recombinant type II pullulanase and application thereof2025
Metasurface-based imaging system, design method, and detector2025
Method and apparatus for low temperature selective epitaxy in a deep trench2025
Liquid crystal alignment method comprising applying an alignment voltage to a fi2025