Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and methods for conditioning a polishing pad

Apparatus and methods for conditioning a polishing pad

US Patent 7963826 · Granted Jun 21, 2011

Estimated economic value: $5,178,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Cleaning system for polishing liquid delivery arm2025
Insulated fluid lines in chemical mechanical polishing2025
Three-dimensional beam forming X-ray source2025
Apparatus and method for CMP temperature control2025
Apparatus and method for CMP temperature control2025
Apparatus and method for CMP temperature control2025
Fluid-tight electrical connection techniques for semiconductor processing2025
Cleaning system for polishing liquid delivery arm2025
Temperature control of chemical mechanical polishing2025
Steam-assisted single substrate cleaning process and apparatus2024
Steam treatment stations for chemical mechanical polishing system2024
Three-dimensional beam forming X-ray source2024