Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications

Self-aligned patterning method by using non-conformal film and etch back for flash memory and other semiconductor applications

US Patent 7732276 · Granted Jun 8, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Creped fibrous structures2025
Discretizer and method of using same2025
Article of manufacture making system2025
Device and method for recovering arsenic and gallium2025
Fibrous structures comprising regions having different micro-CT intensive proper2025
Apparatus for use with hydrogen radicals and method of using same2025
Method of spacer formation with straight sidewall of memory cells2025
Method of spacer formation with straight sidewall of memory cells2025
Coated drug compositions and methods of preparing the same2024
Semiconductor processing preclean methods and apparatus2024
Composite transparent film, preparation method thereof, and method for continuou2024
Metal oxide varistor with reinforced electrodes2024