Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › EUV debris mitigation filter and method for fabricating semiconductor dies using same

EUV debris mitigation filter and method for fabricating semiconductor dies using same

US Patent 7663127 · Granted Feb 16, 2010

Estimated economic value: $19,031,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Multilayer interconnect structure and method for integrated circuits2025
Method for scanning a sample by a charged particle beam system2023
Method for scanning a sample by a charged particle beam system2021
Integration of finFET device2021
Extreme ultraviolet (EUV) lithography mask2020
Method and apparatus for pattern correction and verification2020
Gauge pattern selection2020
Etch-assist features2020
Extreme ultraviolet mirrors and masks with improved reflectivity2019
Optical metrology of lithographic processes using asymmetric sub-resolution feat2019
Pellicle with aerogel support frame2017
Blazed grating spectral purity filter and methods of making such a filter2016