Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus

Method for improving the imaging properties of a projection objective for a microlithographic projection exposure apparatus

US Patent 7456933 · Granted Nov 25, 2008

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Projection exposure apparatus for semiconductor lithography2025
Projection objective including an optical device2025
Facet assembly for a facet mirror2025
Support for an optical element2025
Stop, optical system and lithography apparatus2025
Mirror, in particular for a microlithographic projection exposure apparatus2025
Method and device for characterizing the surface shape of an optical element2024
Projection exposure method and projection lens with setting of the pupil transmi2024
Mirror, in particular for a microlithographic projection exposure apparatus2023
System and method for lateral shearing interferometry in an inspection tool2023
Compensation of creep effects in an imaging device2022
Mirror, in particular for a microlithographic projection exposure system2022