Chemically amplified positive photo resist composition and method for forming resist pattern

Assignee

• Tokyo Ohka Kogyo Co.

Inventors

• Kenji Maruyama (69 patents)
• Masaki Kurihara (69 patents)
• Ken Miyagi (54 patents)
• Satoshi Niikura (15 patents)
• Satoshi Shimatani (12 patents)
• Masahiro Masujima (5 patents)
• Kazuyuki Nitta (32 patents)
• Toshihiro Yamaguchi (21 patents)
• Kousuke Doi (33 patents)

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