Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and system for improving focus accuracy in a lithography system

Method and system for improving focus accuracy in a lithography system

US Patent 7248336 · Granted Jul 24, 2007

Estimated economic value: $3,716,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for region of interest processing for reticle particle detection2025
Method for filtering an image and associated metrology apparatus2025
Systems and methods for measuring intensity in a lithographic alignment apparatu2025
Systems and methods for measuring intensity in a lithographic alignment apparatu2025
Contaminant identification metrology system, lithographic apparatus, and methods2025
Optimization using a non-uniform illumination intensity profile2025
Monolithic particle inspection device2025
Self-referencing integrated alignment sensor2025
Lithographic apparatus and electrostatic clamp designs2024
Alert rule system and method for updating alert rules2024
Spectrometric metrology systems based on multimode interference and lithographic2024
Overlay measurement system using lock-in amplifier technique2024