Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Raster frame beam system for electron beam lithography

Raster frame beam system for electron beam lithography

US Patent 7098468 · Granted Aug 29, 2006

Estimated economic value: $18,591,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Methods and systems for analyte detection and analysis2025
Methods for detecting nucleic acid variants2025
Methods for detecting nucleic acid variants2025
Methods and systems for nucleic acid analysis2025
Linkers and methods for optical detection and sequencing2025
Methods for nucleic acid analysis2025
Solar panel2025
Accelerated sequencing methods2025
Methods and systems for analyte detection and analysis2025
Sequencing using non-natural nucleotides2024
Systems and methods for dispensing items2024
Methods for processing paired end sequences2024