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Home › Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity

Process for increasing the etch resistance and for reducing the hole and trench width of a photoresist structure using solvent systems of low polarity

US Patent 7018784 · Granted Mar 28, 2006

Estimated economic value: $63,000 ⓘ

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