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Home › Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification

Process for structuring a photoresist by UV at less than 160 NM and then aromatic and/or alicyclic amplification

US Patent 7045274 · Granted May 16, 2006

Estimated economic value: $206,000 ⓘ

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