Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for determining and removing phase conflicts on alternating phase masks

Method for determining and removing phase conflicts on alternating phase masks

US Patent 6730463 · Granted May 4, 2004

Estimated economic value: $93,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lithographic mask and method of forming a lithographic mask2012
Method for producing a structure on the surface of a substrate2011
Methods of manufacturing semiconductor structures2011
Method of fabricating an integrated circuit2010
Method and device for classifying cells in a layout into a same environment and 2010
Masks for lithographic imagings and methods for fabricating the same2009
Method for searching for potential faults in a layout of an integrated circuit2009
Method for exposing a semiconductor wafer by applying periodic movement to a com2008
Set of masks including a first mask and a second trimming mask with a semitransp2008
Method for producing a structure on the surface of a substrate2008
Phase shift mask2008
Lithography mask for imaging of convex structures2008