Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for exposing a semiconductor wafer by applying periodic movement to a component

Method for exposing a semiconductor wafer by applying periodic movement to a component

US Patent 7443484 · Granted Oct 28, 2008

Estimated economic value: $283,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for producing a structure on the surface of a substrate2011
Methods of manufacturing semiconductor structures2011
Masks for lithographic imagings and methods for fabricating the same2009
Optical system of a microlithographic projection exposure apparatus2008
Method for producing a structure on the surface of a substrate2008
Phase shift mask2008
Method for forming a structure element on a wafer by means of a mask and a trimm2007
Exposing a semiconductor wafer using two different spectral wavelengths and adju2007
Method for improving a simulation model of photolithographic projection2007
Photolithographic mask2006
Photomask and method of structuring a photoresist by double exposure with imagin2006
Method for determining and removing phase conflicts on alternating phase masks2004