Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration

Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration

US Patent 7286207 · Granted Oct 23, 2007

Estimated economic value: $791,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for producing a rotor, and rotor2025
Winding, rotor and electric motor2023
Braking system2023
Braking system2023
Valve and a valve assembly2023
Braking system2022
Method for producing a structure on the surface of a substrate2011
Mask with registration marks and method of fabricating integrated circuits2011
Methods of manufacturing semiconductor structures2011
Masks for lithographic imagings and methods for fabricating the same2009
Method for exposing a semiconductor wafer by applying periodic movement to a com2008
Method for producing a structure on the surface of a substrate2008