Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Alternating phase mask

Alternating phase mask

US Patent 6660437 · Granted Dec 9, 2003

Estimated economic value: $232,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for determining a critical dimension variation of a photoli2018
Lithographic targets for uniformity control2014
Method and apparatus for minimizing overlay errors in lithography2013
Lithographic mask and method of forming a lithographic mask2012
Lithographic mask and method of forming a lithographic mask2012
Methods of compensating lens heating, lithographic projection system and photo m2010
Method of fabricating an integrated circuit2010
Method and device for classifying cells in a layout into a same environment and 2010
Method for producing a mask for the lithographic projection of a pattern onto a 2010
Reflection mask, use of the reflection mask and method for fabricating the refle2009
System and method for projecting a pattern from a mask onto a substrate2009
Method for reducing an overlay error and measurement mark for carrying out the s2008