Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for producing a mask for the lithographic projection of a pattern onto a substrate

Method for producing a mask for the lithographic projection of a pattern onto a substrate

US Patent 7644389 · Granted Jan 5, 2010

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method and apparatus for determining a critical dimension variation of a photoli2018
Lithographic targets for uniformity control2014
Method and apparatus for minimizing overlay errors in lithography2013
Lithographic mask and method of forming a lithographic mask2012
Methods of compensating lens heating, lithographic projection system and photo m2010
Reflection mask, use of the reflection mask and method for fabricating the refle2009
System and method for projecting a pattern from a mask onto a substrate2009
Method for reducing an overlay error and measurement mark for carrying out the s2008
Method for reducing an overlay error and measurement mark for carrying out the s2008
Set of at least two masks for the projection of structure patterns2008
Set of at least two masks for the projection of structure patterns2008
Set of masks including a first mask and a second trimming mask with a semitransp2008