Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions

Method and apparatus for reducing perfluorocompound gases from substrate processing equipment emissions

US Patent 6187072 · Granted Feb 13, 2001

Estimated economic value: $172,556,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Multi-shield spinal access system2025
Augmented reality based surgical navigation system2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Systems and methods for metastable activated radical selective strip and etch us2025
Multi-shield spinal access system2024
Multi-shield spinal access system2023
Systems and methods for metastable activated radical selective strip and etch us2023
Multi-shield spinal access system2023
Shadow ring for modifying wafer edge and bevel deposition2021
Metal doped carbon based hard mask removal in semiconductor fabrication2021
Multi-shield spinal access system2021