{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method and system for patterning to enhance performance of a metal layer of a semiconductor device", "item": "https://www.patentleaderboard.com/patent/6071824"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025

Method and system for patterning to enhance performance of a metal layer of a semiconductor device

US Patent 6071824 · Granted Jun 6, 2000

Estimated economic value: $15,623,000

Assignee

Inventors

View full patent text on Google Patents →