{"@context": "https://schema.org", "@type": "BreadcrumbList", "itemListElement": [{"@type": "ListItem", "position": 1, "name": "Home", "item": "https://www.patentleaderboard.com/"}, {"@type": "ListItem", "position": 2, "name": "Method for depositing a titanium or tantalum nitride or nitride silicide", "item": "https://www.patentleaderboard.com/patent/5603988"}]}
Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for depositing a titanium or tantalum nitride or nitride silicide

Method for depositing a titanium or tantalum nitride or nitride silicide

US Patent 5603988 · Granted Feb 18, 1997

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Stressed material within gate cut region2025
Metal complexes containing cyclopentadienyl ligands2025
Pneumatic grip systems and material testing systems including pneumatic grip sys2024
Nano multilayer carbon-rich low-k spacer2023
Collision mitigation apparatus material testing systems having collision mitigat2023
Forming shallow trench isolation regions for nanosheet field-effect transistor d2022
Metal complexes containing cyclopentadienyl ligands2022
Dual width finned semiconductor structure2021
Detection of an error generated within an electronic device2021
System, method and computer program product for data transfer management2021
Nanosheet transistor having a strained channel with strain-preserving multi-segm2021
Middle-of-line interconnect having low metal-to-metal interface resistance2021