Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Electrostatic chuck usable in high density plasma

Electrostatic chuck usable in high density plasma

US Patent 5583737 · Granted Dec 10, 1996

Estimated economic value: $24,149,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Photoresist development with halide chemistries2025
Photoresist development with halide chemistries2025
Masking member, and method for coating hollow member2025
Radio-frequency (RF) matching network for fast impedance tuning2025
Auxiliary plasma source for robust ignition and restrikes in a plasma chamber2025
Plasma chamber with multiphase rotating independent gas cross-flow with reduced 2025
Endoscopic multifunctional accessory channel device2025
Endoscopic tissue resection device2025
Low contrast non-referential defect detection2025
System and methods for implementing a micro pulsing scheme using dual independen2025
Substrate support gap pumping to prevent glow discharge and light-up2025
Radio frequency diverter assembly enabling on-demand different spatial2025