Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Fluorine-containing base layer for multi-layer resist processes

Fluorine-containing base layer for multi-layer resist processes

US Patent 4978594 · Granted Dec 18, 1990

Estimated economic value: $16,946,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lateral bipolar junction transistors on a silicon-on-insulator substrate with a 2017
Bipolar transistor with extrinsic base region and methods of fabrication2016
Exposure photolithography methods2016
Developable bottom antireflective coating composition and pattern forming method2015
Removal of alkaline crystal defects in lithographic patterning2015
Developable bottom antireflective coating composition and pattern forming method2015
Photoresist compositions2014
Method and structure for reworking antireflective coating over semiconductor sub2014
Determining lithographic set point using optical proximity correction verificati2013
Diagnosing in-line critical dimension control adjustments using optical proximit2013
Multiple exposure photolithography methods2013
Optical proximity correction verification accounting for mask deviations2013