Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Substrate support, lithographic apparatus and loading method

Substrate support, lithographic apparatus and loading method

US Patent 12032301 · Granted Jul 9, 2024

Estimated economic value: $82,444,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Membrane for EUV lithography2025
Contaminant analyzing metrology system, lithographic apparatus, and methods ther2025
Method of manufacturing a substrate support for a lithographic apparatus, substr2025
Method of manufacturing a pellicle for a lithographic apparatus, a pellicle for 2025
Pellicle and pellicle assembly2024
Pellicle and pellicle assembly2024
Pellicle and pellicle assembly2024
Systems and methods for adjusting prediction models between facility locations2024
Metal-silicide-nitridation for stress reduction2024
Simultaneous double-side coating of multilayer graphene pellicle by local therma2024
Method for providing a wear-resistant material on a body, and composite body2024
Membrane for EUV lithography2023