Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for optimizing a lithography exposure process

System and method for optimizing a lithography exposure process

US Patent 11126096 · Granted Sep 21, 2021

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Method for preparing ceramic materials and products thereof2025
Hard optical film, method for preparing same and use thereof2025
Polymer composite material and preparation method thereof2025
Semiconductor substrate yield prediction based on spectra data from multiple sub2024
Semiconductor substrate yield prediction based on spectra data from multiple sub2024
Scintillating material, preparation method and use thereof2024
Gradient metallic structure and surface treatment to produce a gradient metallic2024
Hybrid system for electricity and water generation, passive cooling induced co-g2024
Evaporator for solar desalination, preparation method therefor and use thereof2024
Direct 4D printing gradient structure ceramics2024
Method for preparing ceramic materials2024
Ultra-flat and low-friction metallic glass film and a method for preparing the s2024