Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › System and method for localized EUV pellicle glue removal

System and method for localized EUV pellicle glue removal

US Patent 11079669 · Granted Aug 3, 2021

Estimated economic value: $15,057,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Charge control system and method thereof2025
Snap to road, popular routes, popular stops, predicting roadway speed, and conti2025
Lithography method with reduced impacts of mask defects2025
Lithography method with reduced impacts of mask defects2025
High throughput and high position accurate method for particle inspection of mas2025
Method and device for cleaning substrates2025
Method and device for cleaning substrates2025
EUV photo masks and manufacturing method thereof2025
Package structure and manufacturing method thereof2025
Acoustic measurement of fabrication equipment clearance2025
Acoustic measurement of fabrication equipment clearance2025
Methods for cleaning lithography mask2025