Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for semiconductor processing chamber isolation for reduced particles and improved uniformity

Method and apparatus for semiconductor processing chamber isolation for reduced particles and improved uniformity

US Patent 10679827 · Granted Jun 9, 2020

Estimated economic value: $53,212,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Atomic layer deposition coating system for inner walls of gas lines2025
Parallel atomic layer deposition of target element interiors2025
Methods and apparatus for processing a substrate2025
Electrostatic chuck with improved temperature control2025
Friction stir welding in semiconductor manufacturing applications2025
Susceptor manufacturing method and the manufactured susceptor using the same2025
Atomic layer deposition part coating chamber2024
Mass flow controller based fast gas exchange2024
Semiconductor processing chambers for deposition and etch2024
Pre-loaded bowl mechanism for providing a symmetric radio frequency return path2024
Common substrate and shadow ring lift apparatus2024
Semiconductor processing chambers for deposition and etch2023