Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method for three-dimensionally measuring a 3D aerial image of a lithography mask

Method for three-dimensionally measuring a 3D aerial image of a lithography mask

US Patent 10634886 · Granted Apr 28, 2020

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Apparatus and method for manipulating a focus of excitation light on or in a sam2025
Method and device for determining the optimal position of the focal plane for ex2025
Method and device for evaluating a statistically distributed measured value in t2025
Method and apparatus for evaluating an unknown effect of defects of an element o2024
Imaging optical arrangement to image an object illuminated by X-rays2024
Apparatus and method for analyzing an element of a photolithography process with2024
Method to acquire a 3D image of a sample structure2024
Method and device for characterizing the surface shape of an optical element2024
Apparatus and method for characterizing a microlithographic mask2024
Apparatus and method for characterizing a microlithographic mask2024
Apparatus and method for characterizing a microlithographic mask2024
Method for detecting an object structure and apparatus for carrying out the meth2024