Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Methods to enhance effective work function of mid-gap metal by incorporating oxygen and hydrogen at a low thermal budget

Methods to enhance effective work function of mid-gap metal by incorporating oxygen and hydrogen at a low thermal budget

US Patent 10439040 · Granted Oct 8, 2019

Estimated economic value: $23,869,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Conductive superlattice structures and methods of forming the same2025
Method of forming a FET structure by selective deposition of film on source/drai2025
Dual metal wrap-around contacts for semiconductor devices2025
Method for filling recessed features in semiconductor devices with a low-resisti2025
Low resistance source drain contact formation with trench metastable alloys and 2023
Dual metal wrap-around contacts for semiconductor devices2022
Reverse contact and silicide process for three-dimensional logic devices2022
Robust low-k bottom spacer for VFET2021
Dual metal contacts with ruthenium metal plugs for semiconductor devices2021
High mobility transistors2021
Transistor having straight bottom spacers2021
Replacement metal gate process for CMOS integrated circuits2020