Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same

Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same

US Patent 10274820 · Granted Apr 30, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Lithography method using multi-scale simulation, semiconductor device manufactur2024
Apparatus and method for controlling interference between base stations in wirel2024
Method and apparatus for assigning resources in wireless communication system2023
Apparatus and method for managing interference in wireless communication system2023
Lithography method using multi-scale simulation, semiconductor device manufactur2022
Phase-shift mask for extreme ultraviolet lithography2022
Methods of forming a pattern and methods of fabricating a semiconductor device2022
Method and apparatus for allocating resource in wireless communication system2021
Phase-shift mask for extreme ultraviolet lithography2020
Photomasks2020
Methods, systems and computer program products configured to adjust a critical d2019
Methods, systems and computer program products configured to adjust a critical d2019