Issued Patents All Time
Showing 1–6 of 6 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11333979 | Methods of forming a pattern and methods of fabricating a semiconductor device | Byounghoon Lee, Jumi Bang, Byoungsup Ahn | 2022-05-17 |
| 10274820 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Hwanchul JEON, Munja Kim, Sungwon Kwon, Byunggook Kim, Roman Chalykh +1 more | 2019-04-30 |
| 10224178 | Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices | Sungwon Kwon, Heebom Kim, Donggun Lee | 2019-03-05 |
| 9952502 | Pellicle for preventing thermal accumulation and extreme ultra-violet lithography apparatus having the same | Hwanchul JEON, Munja Kim, Sungwon Kwon, Byunggook Kim, Roman Chalykh +1 more | 2018-04-24 |
| 9411236 | Patterning method using electron beam and exposure system configured to perform the same | Sanghee Lee | 2016-08-09 |
| 9164389 | Patterning method using electron beam and exposure system configured to perform the same | Sanghee Lee | 2015-10-20 |