Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Apparatus and methods for wafer rotation to improve spatial ALD process uniformity

Apparatus and methods for wafer rotation to improve spatial ALD process uniformity

US Patent 10186449 · Granted Jan 22, 2019

Estimated economic value: $28,931,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Rotary reactor for uniform particle coating with thin films2025
Workpiece handling architecture for high workpiece throughput2025
Workpiece handling architecture for high workpiece throughput2025
Processing chamber with annealing mini-environment2025
Apparatus and methods for semiconductor processing2025
Apparatus and methods for wafer chucking on a susceptor for ALD2024
Spinning disk with electrostatic clamped platens for ion implantation2024
Apparatus and methods for semiconductor processing2024
Transport system2024
Enhanced spatial ALD of metals through controlled precursor mixing2024
Multi-wafer volume single transfer chamber facet2023
Contour pocket and hybrid susceptor for wafer uniformity2023