Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Forming MOSFET structures with work function modification

Forming MOSFET structures with work function modification

US Patent 10170477 · Granted Jan 1, 2019

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Reduced capacitance between power via bar and gates2025
Dielectric tuning of negative capacitance in dual channel field effect transisto2025
Backside self aligned skip via2025
Source/drain contact at tight cell boundary2025
Light sensor and a method for manufacturing a light sensor2025
Non-overlapping gate conductors for GAA transistors2025
Wrap around metal via structure2025
Vertical transport field effect transistor (VTFET) with backside wraparound cont2025
Stacked field effect transistor structure with independent gate control between 2025
Bottom contact with self-aligned spacer for stacked semiconductor devices2025
Wraparound contact with reduced distance to channel2025
Wraparound contact with reduced distance to channel2025