Photoresist cleaning composition used in photolithography and a method for treating substrate therewith

Assignee

• Versum Materials Us

Inventors

• Randy Li-Kai Chang (1 patents)
• Gene Everad Parris (18 patents)
• Hsiu-Mei Chen (4 patents)
• Yi-Chia Lee (37 patents)
• Wen Dar Liu (34 patents)
• Tianniu Chen (53 patents)
• Laura M. Matz (16 patents)
• Ryback Li Chang Lo (1 patents)
• Ling-Jen Meng (1 patents)

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