Issued Patents All Time
Showing 26–48 of 48 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7903192 | Display device and method of manufacturing the same | Hitoshi Azuma, Susumu Sasaki, Takao Ebine, Tomio Yaguchi, Akiko Iwata | 2011-03-08 |
| 7553208 | Manufacturing method of organic electroluminescence display device | Akiko Yasukawa, Emiko Yamada, Nobuaki Hayashi | 2009-06-30 |
| 6555295 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Naoko Asai | 2003-04-29 |
| 6461776 | Resist pattern forming method using anti-reflective layer, with variable extinction coefficient | Toshihiko Tanaka, Naoko Asai | 2002-10-08 |
| 6355400 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Naoko Asai | 2002-03-12 |
| 6255036 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Naoko Asai | 2001-07-03 |
| 6162588 | Resist pattern forming method using anti-reflective layer and method of etching using resist pattern | Toshihiko Tanaka, Naoko Asai | 2000-12-19 |
| 5985517 | Resist pattern forming method using anti-reflective layer resist | Toshihiko Tanaka, Naoko Asai | 1999-11-16 |
| 5935765 | Resist pattern forming method using anti-reflective layer with variable extinction coefficient | Toshihiko Tanaka, Naoko Asai | 1999-08-10 |
| 5846693 | Resist pattern forming method using anti-reflective layer with variable extinction coefficient | Toshihiko Tanaka, Naoko Asai | 1998-12-08 |
| 5733712 | Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formed | Toshihiko Tanaka, Naoko Asai | 1998-03-31 |
| 4985344 | Radiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayer | Takumi Ueno, Takao Iwayanagi, Saburo Nonogaki, Michiaki Hashimoto | 1991-01-15 |
| 4857429 | Process of improving optical contact of patternwise powdery coating layer and phosphor screen provided therefore | Nobuaki Hayashi, Yoshifumi Tomita, Saburo Nonogaki, Masahiro Nishizawa | 1989-08-15 |
| 4815821 | Face plate for display | Saburo Nonogaki, Hajime Morishita, Nobuaki Hayashi, Yoshifumi Tomita, Masahiro Nishizawa +1 more | 1989-03-28 |
| 4735880 | Photosensitive composition and pattern forming process using same | Hajime Morishita, Saburo Nonogaki, Nobuaki Hayashi, Masahiro Nishizawa, Kiyoshi Miura +2 more | 1988-04-05 |
| 4520094 | Process for forming powder pattern on light exposed layer having photosensitive diazonium salts | Hajime Morishita, Motoo Akagi, Nobuaki Hayashi, Saburo Nonogaki, Takahiro Kohashi | 1985-05-28 |
| 4510226 | Photosensitive composition and pattern forming process using same | Hajime Morishita, Motoo Akagi, Saburo Nonogaki, Nobuaki Hayashi | 1985-04-09 |
| 4409313 | Powder deposition to form pattern on light imaged photosensitive diazonium salt coating having salt of aromatic amine | Hajime Morishita, Takahiro Kohashi, Saburo Nonogaki, Motoo Akagi, Nobuaki Hayashi | 1983-10-11 |
| 4407916 | Process for forming fluorescent screen | Motoo Akagi, Saburo Nonogaki | 1983-10-04 |
| 4377630 | Photosensitive composition | Hajime Morishita, Takahiro Kohashi, Saburo Nonogaki, Motoo Akagi, Nobuaki Hayashi | 1983-03-22 |
| 4318971 | Method of forming fluorescent screen of color picture tube | Masahiro Nishizawa, Kiyoshi Miura, Hiroshi Yokomizo, Osamu Sasaya, Hajime Morishita | 1982-03-09 |
| 4276363 | Process for forming phosphor screens with treated phosphors | Toshikatsu Manabe, Saburo Nonogaki, Hajime Morishita, Yoshifumi Tomita, Masahiro Nishizawa +2 more | 1981-06-30 |
| 4269918 | Process for forming patternwise coated powder layer | Saburo Nonogaki, Hajime Morishita, Toshikatsu Manabe | 1981-05-26 |