Issued Patents All Time
Showing 1–20 of 20 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8994197 | Alignment mark and method of manufacturing the same | Chen Ku Chiang | 2015-03-31 |
| 8723341 | Alignment mark and method of manufacturing the same | Chen Ku Chiang | 2014-05-13 |
| 8043794 | Method of double patterning, method of processing a plurality of semiconductor wafers and semiconductor device | Christoph Noelscher, Yi-Ming Chiu | 2011-10-25 |
| 7811723 | Phase-shift mask and method for forming a pattern | Kuo-Kuei Fu, Ya-Chih Wang | 2010-10-12 |
| 7504184 | Phase-shifting mask for equal line/space dense line patterns | Yung-Long Hung | 2009-03-17 |
| 7504183 | Chromeless phase-shifting mask for equal line/space dense line patterns | Yung-Long Hung, Chia-Tsung Hung | 2009-03-17 |
| 7419882 | Alignment mark and alignment method for the fabrication of trench-capacitor dram devices | An-Hsiung Liu, Chiang-Lin Shih, Pei-Ing Lee, Hui-Min Mao, Lin-Chin Su | 2008-09-02 |
| 7205075 | Method of forming a vertical memory device with a rectangular trench | Yu-Sheng Shu, Chung-Yuan Lee, Shian-Jyh Lin | 2007-04-17 |
| 7165233 | Test ket layout for precisely monitoring 3-foil lens aberration effects | — | 2007-01-16 |
| 7014965 | Photolithography method for reducing effects of lens aberration | Chun-Cheng Liao | 2006-03-21 |
| 7012763 | Aperture plate for lithography systems | — | 2006-03-14 |
| 6998226 | Method of forming patterned photoresist layer | Wen-Bin Wu, Yung-Long Hung, Ya-Chih Wang | 2006-02-14 |
| 6977715 | Method for optimizing NILS of exposed lines | — | 2005-12-20 |
| 6929902 | Method of preventing repeated collapse in a reworked photoresist layer | Teng-Yen Huang, Wen-Bin Wu, Yi-Nan Chen | 2005-08-16 |
| 6866975 | Best focus determining method | — | 2005-03-15 |
| 6858355 | Mask and method for defining a guard ring pattern | Hsien-Jung Wang | 2005-02-22 |
| 6847445 | Method for estimating repair accuracy of a mask shop | — | 2005-01-25 |
| 6759328 | Masks and method for contact hole exposure | — | 2004-07-06 |
| 6699800 | Pattern design method for lithography C/H process | — | 2004-03-02 |
| 6654703 | Method for estimating repair accuracy of a mask shop | — | 2003-11-25 |