Issued Patents All Time
Showing 1–10 of 10 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11021784 | Method of mask layout | Enxia WANG, Lingtao Ou, Weili Li, Xiaopeng LV, Shuaiyan GAN | 2021-06-01 |
| 9530663 | Method for forming a pattern | Chiang-Lin Shih, Shu-Hao Hsu | 2016-12-27 |
| 9318412 | Method for semiconductor self-aligned patterning | An-Hsiung Liu | 2016-04-19 |
| 8697316 | Hard mask spacer structure and fabrication method thereof | Hai-Han Hung, Wen-Chieh Wang | 2014-04-15 |
| 8658051 | Lithography resolution improving method | Kuo-Yao Cho, Wen-Bin Wu, Chiang-Lin Shih, Chao-Wen Lay, CHIH-HUANG WU | 2014-02-25 |
| 8368869 | Lithography apparatus with an optical fiber module | Wei-Cheng Shiu | 2013-02-05 |
| 8216946 | Patterning method | Wei-Cheng Shiu, Hai-Han Hung, Chien-Mao Liao, Shing-Yih Shih | 2012-07-10 |
| 7811723 | Phase-shift mask and method for forming a pattern | Kuo-Kuei Fu, Yuan-Hsun Wu | 2010-10-12 |
| 7799697 | Patterning method in semiconductor manufacturing process including an array of rectangular blocks and filling features | Wei-Cheng Shiu | 2010-09-21 |
| 6998226 | Method of forming patterned photoresist layer | Yuan-Hsun Wu, Wen-Bin Wu, Yung-Long Hung | 2006-02-14 |