Issued Patents All Time
Showing 1–18 of 18 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6078079 | Semiconductor device and method of manufacturing the same | — | 2000-06-20 |
| 5849616 | Method of manufacturing a semiconductor device | — | 1998-12-15 |
| 5547885 | Method of making asymmetric LDD transistor | — | 1996-08-20 |
| 5436482 | MOSFET with assymetric lightly doped source-drain regions | — | 1995-07-25 |
| 5323343 | DRAM device comprising a stacked type capacitor and a method of manufacturing thereof | Masao Nagatomo | 1994-06-21 |
| 5300444 | Method of manufacturing a semiconductor device having a stacked structure formed of polycrystalline silicon film and silicon oxide film | Atsushi Hachisuka, Masao Nagatomo, Hideki Genjou, Yoshinori Okumura, Takayuki Matsukawa | 1994-04-05 |
| 5254866 | LDD CMOS with wider oxide sidewall on PMOS than NMOS | — | 1993-10-19 |
| 5231041 | Manufacturing method of an electrically programmable non-volatile memory device having the floating gate extending over the control gate | Hideaki Arima, Yoshinori Okumura, Hideki Genjo, Kohjiroh Yuzuriha, Yuichi Nakashima | 1993-07-27 |
| 5153689 | Semiconductor memory device having bit lines formed of an interconnecting layer of lower reflectance material than the material of the word lines | Yoshinori Okumura, Takayuki Matsukawa, Masao Nagatomo, Hideki Genjo, Atsushi Hachisuka | 1992-10-06 |
| 5101250 | Electrically programmable non-volatile memory device and manufacturing method thereof | Hideaki Arima, Yoshinori Okumura, Hideki Genjo, Kohjiroh Yuzuriha, Yuichi Nakashima | 1992-03-31 |
| 5101251 | Semiconductor memory device with improved stacked capacitor structure | Wataru Wakamiya | 1992-03-31 |
| 5097137 | Light irradiation apparatus used in manufacturing semiconductor device | — | 1992-03-17 |
| 5075240 | Semiconductor device manufactured by using conductive ion implantation mask | Yomiyuki Yama, Masatoshi Yasunaga, Katsuyoshi Mitsui | 1991-12-24 |
| 5001039 | Method of manufacturing semiconductor device comprising step of patterning resist and light irradiation apparatus used by the manufacturing method | — | 1991-03-19 |
| 4956692 | Semiconductor device having an isolation oxide film | Hiroji Ozaki, Masahiro Yoneda, Yoshinori Okumura, Wataru Wakamiya, Masao Nagatomo | 1990-09-11 |
| 4905068 | Semiconductor device having interconnection layers of T-shape cross section | Shinichi Satoh, Makoto Hirayama, Masao Nagatomo, Yoshikazu Ohno, Masato Fujinaga | 1990-02-27 |
| 4903117 | Semiconductor device | Tatsuo Okamoto | 1990-02-20 |
| 4772569 | Method for forming oxide isolation films on french sidewalls | Tatsuya Ishii | 1988-09-20 |