Issued Patents All Time
Showing 25 most recent of 31 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12432943 | Over-sculpted storage node | Devesh Dadhich Shreeram, Kangle Li, Sevim Korkmaz | 2025-09-30 |
| 12193208 | Capacitors with electrodes having a portion of material removed, and related semiconductor devices, systems, and methods | Devesh Dadhich Shreeram, Kangle Li, Matthew N. Rocklein, Wei Ching Huang, Ping Hsu +2 more | 2025-01-07 |
| 11651952 | Using sacrificial polymer materials in semiconductor processing | Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Ian K. McDaniel | 2023-05-16 |
| 11469103 | Semiconductor structure formation | Nicholas R. Tapias, Anish A. Khandekar, Shen Hu | 2022-10-11 |
| 11361972 | Methods for selectively removing more-doped-silicon-dioxide relative to less-doped-silicon-dioxide | Jerome A. Imonigie, Ramaswamy Ishwar Venkatanarayanan, Pranav P. Sharma, Eric E. Kron | 2022-06-14 |
| 11322388 | Semiconductor structure formation | Vivek Yadav, Shen Hu, Kangle Li | 2022-05-03 |
| 11127588 | Semiconductor processing applying supercritical drying | Sevim Korkmaz, Jerome A. Imonigie, Armin Saeedi Vahdat | 2021-09-21 |
| 11114443 | Semiconductor structure formation | Vivek Yadav, Fatma Arzum Simsek-Ege, Thomas A. Figura, Kangle Li | 2021-09-07 |
| 11011521 | Semiconductor structure patterning | Sevim Korkmaz, Devesh Dadhich Shreeram, Srinivasan Balakrishnan, Dewali Ray, Paul A. Paduano | 2021-05-18 |
| 11011523 | Column formation using sacrificial material | Devesh Dadhich Shreeram, Diem Thy N. Tran | 2021-05-18 |
| 10978306 | Semiconductor recess formation | Jerome A. Imonigie, Adriel Jebin Jacob Jebaraj, Brian J. Kerley, Ashwin Panday | 2021-04-13 |
| 10978553 | Formation of a capacitor using a hard mask | Diem Thy N. Tran, Devesh Dadhich Shreeram | 2021-04-13 |
| 10964475 | Formation of a capacitor using a sacrificial layer | Devesh Dadhich Shreeram, Sevim Korkmaz, Jian Li, Dewali Ray | 2021-03-30 |
| 10930499 | Semiconductor structure formation | Nicholas R. Tapias, Anish A. Khandekar, Shen Hu | 2021-02-23 |
| 10916418 | Using sacrificial polymer materials in semiconductor processing | Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Ian K. McDaniel | 2021-02-09 |
| 10811419 | Storage node shaping | Devesh Dadhich Shreeram, Sanket S. Kelkar, Gurpreet Lugani, Paul A. Paduano, Matthew N. Rocklein +1 more | 2020-10-20 |
| 10777561 | Semiconductor structure formation | Devesh Dadhich Shreeram, Masihhur R. Laskar, Darwin Franseda Fan, Jerome A. Imonigie | 2020-09-15 |
| 10607851 | Vapor-etch cyclic process | Andrew Li, Prashant Raghu, Rita J. Klein, Sanh D. Tang, Sourabh Dhir | 2020-03-31 |
| 10546923 | Semiconductor assemblies having semiconductor material regions with contoured upper surfaces; and methods of forming semiconductor assemblies utilizing etching to contour upper surfaces of semiconductor material | Pranav P. Sharma, Vinay Nair | 2020-01-28 |
| 10497558 | Using sacrificial polymer materials in semiconductor processing | Michael T. Andreas, Jerome A. Imonigie, Prashant Raghu, Ian K. McDaniel | 2019-12-03 |
| 10374033 | Semiconductor assemblies having semiconductor material regions with contoured upper surfaces | Pranav P. Sharma, Vinay Nair | 2019-08-06 |
| 9653307 | Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures | Jerome A. Imonigie, Ian C. Laboriante, Michael T. Andreas, Prashant Raghu | 2017-05-16 |
| 9397210 | Forming air gaps in memory arrays and memory arrays with air gaps thus formed | James Mathew, Gordon A. Haller, Ronald A. Weimer, John D. Hopkins, Vinayak Shamanna | 2016-07-19 |
| 9230966 | Capacitor and method of manufacturing the same | Brett W. Busch, Jian Li, Chad Patrick Blessing, Greg Allen Funston | 2016-01-05 |
| 9117759 | Methods of forming bulb-shaped trenches in silicon | Cheng Chen, Hung-Ming Tsai, Sheng-Wei Yang | 2015-08-25 |