Issued Patents All Time
Showing 25 most recent of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11651952 | Using sacrificial polymer materials in semiconductor processing | Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel | 2023-05-16 |
| 10916418 | Using sacrificial polymer materials in semiconductor processing | Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel | 2021-02-09 |
| 10593559 | Etching process in capacitor process of DRAM using a liquid etchant composition | — | 2020-03-17 |
| 10497558 | Using sacrificial polymer materials in semiconductor processing | Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel | 2019-12-03 |
| 9653307 | Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures | Jerome A. Imonigie, Ian C. Laboriante, Sanjeev Sapra, Prashant Raghu | 2017-05-16 |
| 8283257 | Systems and methods for oscillating exposure of a semiconductor workpiece to multiple chemistries | — | 2012-10-09 |
| 8025809 | Polishing methods | — | 2011-09-27 |
| 7964109 | Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution | — | 2011-06-21 |
| 7468105 | CMP cleaning composition with microbial inhibitor | — | 2008-12-23 |
| 7402259 | Chemical-mechanical polishing methods | — | 2008-07-22 |
| 7367343 | Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution | — | 2008-05-06 |
| 7235494 | CMP cleaning composition with microbial inhibitor | — | 2007-06-26 |
| 7151026 | Semiconductor processing methods | — | 2006-12-19 |
| 7066790 | Chemical-mechanical polishing methods | — | 2006-06-27 |
| 7033978 | Post-planarization clean-up | — | 2006-04-25 |
| 7023099 | Wafer cleaning method and resulting wafer | Paul A. Morgan | 2006-04-04 |
| 7014537 | Method of processing a semiconductor substrate | — | 2006-03-21 |
| 6972227 | Semiconductor processing methods, and methods of forming a dynamic random access memory (DRAM) storage capacitor | — | 2005-12-06 |
| 6936534 | Method for the post-etch cleaning of multi-level damascene structures having underlying copper metallization | — | 2005-08-30 |
| 6936540 | Method of polishing a semiconductor substrate, post-CMP cleaning process, and method of cleaning residue from registration alignment markings | — | 2005-08-30 |
| 6930017 | Wafer Cleaning method and resulting wafer | Paul A. Morgan | 2005-08-16 |
| 6908569 | Ruthenium silicide wet etch | Brenda D. Kraus | 2005-06-21 |
| 6835121 | Chemical-mechanical polishing methods | — | 2004-12-28 |
| 6835668 | Copper post-etch cleaning process | Paul A. Morgan | 2004-12-28 |
| 6787473 | Post-planarization clean-up | — | 2004-09-07 |