Michael T. Andreas — 45 Patents at Micron

Michael T. Andreas has been granted 45 US patents while listed as an inventor at Micron. The first was granted in 1999 and the most recent in May 2023. Michael T. Andreas ranks #64,393 of 4,157,543 US inventors in our database (top 1.5%). Patent records list Michael T. Andreas in Boise, ID, US.

Issued Patents All Time

Showing 1–25 of 45 patents

Patent #	Title	Co-Inventors	Date	Approx Value ⓘ
11651952	Using sacrificial polymer materials in semiconductor processing	Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel	2023-05-16	$14,212,000
10916418	Using sacrificial polymer materials in semiconductor processing	Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel	2021-02-09	$22,943,000
10593559	Etching process in capacitor process of DRAM using a liquid etchant composition	—	2020-03-17
10497558	Using sacrificial polymer materials in semiconductor processing	Jerome A. Imonigie, Prashant Raghu, Sanjeev Sapra, Ian K. McDaniel	2019-12-03	$20,797,000
9653307	Surface modification compositions, methods of modifying silicon-based materials, and methods of forming high aspect ratio structures	Jerome A. Imonigie, Ian C. Laboriante, Sanjeev Sapra, Prashant Raghu	2017-05-16	$14,903,000
8283257	Systems and methods for oscillating exposure of a semiconductor workpiece to multiple chemistries	—	2012-10-09	$2,419,000
8025809	Polishing methods	—	2011-09-27	$2,769,000
7964109	Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution	—	2011-06-21	$3,062,000
7468105	CMP cleaning composition with microbial inhibitor	—	2008-12-23	$4,004,000
7402259	Chemical-mechanical polishing methods	—	2008-07-22	$1,260,000
7367343	Method of cleaning a surface of a cobalt-containing material, method of forming an opening to a cobalt-containing material, semiconductor processing method of forming an integrated circuit comprising a copper-containing conductive line, and a cobalt-containing film cleaning solution	—	2008-05-06	$1,255,000
7235494	CMP cleaning composition with microbial inhibitor	—	2007-06-26	$1,771,000
7151026	Semiconductor processing methods	—	2006-12-19	$2,309,000
7066790	Chemical-mechanical polishing methods	—	2006-06-27	$1,742,000
7033978	Post-planarization clean-up	—	2006-04-25	$2,785,000
7023099	Wafer cleaning method and resulting wafer	Paul A. Morgan	2006-04-04	$2,376,000
7014537	Method of processing a semiconductor substrate	—	2006-03-21	$2,245,000
6972227	Semiconductor processing methods, and methods of forming a dynamic random access memory (DRAM) storage capacitor	—	2005-12-06	$2,816,000
6936534	Method for the post-etch cleaning of multi-level damascene structures having underlying copper metallization	—	2005-08-30	$1,004,000
6936540	Method of polishing a semiconductor substrate, post-CMP cleaning process, and method of cleaning residue from registration alignment markings	—	2005-08-30	$1,004,000
6930017	Wafer Cleaning method and resulting wafer	Paul A. Morgan	2005-08-16	$1,281,000
6908569	Ruthenium silicide wet etch	Brenda D. Kraus	2005-06-21	$1,292,000
6835121	Chemical-mechanical polishing methods	—	2004-12-28	$1,491,000
6835668	Copper post-etch cleaning process	Paul A. Morgan	2004-12-28	$1,491,000
6787473	Post-planarization clean-up	—	2004-09-07	$988,000

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Michael T. Andreas — 45 Patents

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