Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6740252 | Ruthenium silicide wet etch | Brenda D. Kraus | 2004-05-25 |
| 6635562 | Methods and solutions for cleaning polished aluminum-containing layers | — | 2003-10-21 |
| 6627550 | Post-planarization clean-up | — | 2003-09-30 |
| 6613674 | Semiconductor processing methods of forming integrated circuitry, and methods of forming dynamic random access memory circuitry | — | 2003-09-02 |
| 6589882 | Copper post-etch cleaning process | Paul A. Morgan | 2003-07-08 |
| 6498110 | Ruthenium silicide wet etch | Brenda D. Kraus | 2002-12-24 |
| 6468951 | Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication | Eric K. Grieger, Michael A. Walker | 2002-10-22 |
| 6399492 | Ruthenium silicide processing methods | Paul A. Morgan | 2002-06-04 |
| 6387812 | Ultrasonic processing of chemical mechanical polishing slurries | — | 2002-05-14 |
| 6375548 | Chemical-mechanical polishing methods | — | 2002-04-23 |
| 6358325 | Polysilicon-silicon dioxide cleaning process performed in an integrated cleaner with scrubber | — | 2002-03-19 |
| 6273100 | Surface cleaning apparatus and method | Michael A. Walker | 2001-08-14 |
| 6269511 | Surface cleaning apparatus | Michael A. Walker | 2001-08-07 |
| 6265781 | Methods and solutions for cleaning polished aluminum-containing layers, methods for making metallization structures, and the structures resulting from these methods | — | 2001-07-24 |
| 6124207 | Slurries for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies, and methods and apparatuses for making and using such slurries | Karl M. Robinson | 2000-09-26 |
| 6077785 | Ultrasonic processing of chemical mechanical polishing slurries | — | 2000-06-20 |
| 6044851 | Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication | Eric K. Grieger, Michael A. Walker | 2000-04-04 |
| 5963814 | Method of forming recessed container cells by wet etching conductive layer and dissimilar layer formed over conductive layer | Michael A. Walker | 1999-10-05 |
| 5895550 | Ultrasonic processing of chemical mechanical polishing slurries | — | 1999-04-20 |
| 5855811 | Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication | Eric K. Grieger, Michael A. Walker | 1999-01-05 |