Issued Patents All Time
Showing 1–13 of 13 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8940102 | Methods of removing particles from over semiconductor substrates | Dan B. Millward, Wayne H. Huang | 2015-01-27 |
| 8853682 | Methods of self-aligned growth of chalcogenide memory access device | Gurtej S. Sandhu, John Smythe, Bhaskar Srinivasan | 2014-10-07 |
| 8686411 | Methods of self-aligned growth of chalcogenide memory access device | Bhaskar Srinivasan, Gurtej S. Sandhu, John Smythe | 2014-04-01 |
| 8461060 | Method and apparatus providing air-gap insulation between adjacent conductors using nanoparticles | Nishant Sinha, Gurtej S. Sandhu, John Smythe | 2013-06-11 |
| 8415661 | Methods of self-aligned growth of chalcogenide memory access device | Bhaskar Srinivasan, Gurtej S. Sandhu, John Smythe | 2013-04-09 |
| 8298964 | Method and apparatus providing air-gap insulation between adjacent conductors using nanoparticles | Nishant Sinha, Gurtej S. Sandhu, John Smythe | 2012-10-30 |
| 8226772 | Methods of removing particles from over semiconductor substrates | Dan B. Millward, Wayne H. Huang | 2012-07-24 |
| 8198124 | Methods of self-aligned growth of chalcogenide memory access device | Bhaskar Srinivasan, Gurtej S. Sandhu, John Smythe | 2012-06-12 |
| 8183157 | Method of forming capacitors, and methods of utilizing silicon dioxide-containing masking structures | Naraji B Rana, Nishant Sinha, Prashant Raghu, Jim Hofmann | 2012-05-22 |
| 8034315 | Methods of forming devices comprising carbon nanotubes | Nishant Sinha, Gurtej S. Sandhu, Eugene P. Marsh, John Smythe | 2011-10-11 |
| 8026148 | Methods of utilizing silicon dioxide-containing masking structures | Niraj Rana, Nishant Sinha, Prashant Raghu, Jim Hofmann | 2011-09-27 |
| 7952174 | Method and apparatus providing air-gap insulation between adjacent conductors using nanoparticles | Nishant Sinha, Gurtej S. Sandhu, John Smythe | 2011-05-31 |
| 7892937 | Methods of forming capacitors | Niraj Rana, Nishant Sinha, Prashant Raghu, Jim Hofmann | 2011-02-22 |