Issued Patents All Time
Showing 51–72 of 72 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6541391 | Methods of cleaning surfaces of copper-containing materials, and methods of forming openings to copper-containing substrates | David M. Smith, Paul A. Morgan | 2003-04-01 |
| 6517738 | Acid blend for removing etch residue | Donald L. Yates | 2003-02-11 |
| 6453914 | Acid blend for removing etch residue | Donald L. Yates | 2002-09-24 |
| 6372657 | Method for selective etching of oxides | Max Hineman | 2002-04-16 |
| 6350547 | Oxide structure having a finely calibrated thickness | — | 2002-02-26 |
| 6290863 | Method and apparatus for etch of a specific subarea of a semiconductor work object | Paul A. Morgan | 2001-09-18 |
| 6235145 | System for wafer cleaning | Li Li, Donald L. Westmoreland, Richard C. Hawthorne | 2001-05-22 |
| 6232232 | High selectivity BPSG to TEOS etchant | Whonchee Lee | 2001-05-15 |
| 6200909 | Method for selective etching of antireflective coatings | Whonchee Lee, Satish Bedge | 2001-03-13 |
| 6194286 | Method of etching thermally grown oxide substantially selectively relative to deposited oxide | — | 2001-02-27 |
| 6165853 | Trench isolation method | Michael Nuttall, David L. Chapek | 2000-12-26 |
| 6150277 | Method of making an oxide structure having a finely calibrated thickness | — | 2000-11-21 |
| 6103637 | Method for selective etching of antireflective coatings | Whonchee Lee, Satish Bedge | 2000-08-15 |
| 6090683 | Method of etching thermally grown oxide substantially selectively relative to deposited oxide | — | 2000-07-18 |
| 6087273 | Process for selectively etching silicon nitride in the presence of silicon oxide | Whonchee Lee | 2000-07-11 |
| 5990019 | Selective etching of oxides | Whonchee Lee, Richard C. Hawthorne | 1999-11-23 |
| 5981401 | Method for selective etching of anitreflective coatings | Whonchee Lee, Satish Bedge | 1999-11-09 |
| 5885903 | Process for selectively etching silicon nitride in the presence of silicon oxide | Whonchee Lee | 1999-03-23 |
| 5783495 | Method of wafer cleaning, and system and cleaning solution regarding same | Li Li, Donald L. Westmoreland, Richard C. Hawthorne | 1998-07-21 |
| 5685951 | Methods and etchants for etching oxides of silicon with low selectivity in a vapor phase system | Whonchee Lee, Richard C. Hawthorne | 1997-11-11 |
| 5439553 | Controlled etching of oxides via gas phase reactions | Robert W. Grant, Jerzy Ruzyllo | 1995-08-08 |
| 5234540 | Process for etching oxide films in a sealed photochemical reactor | Robert W. Grant, Richard Novak, Jerzy Ruzyllo | 1993-08-10 |