Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9129919 | Production of high precipitate density wafers by activation of inactive oxygen precipitate nuclei | Robert J. Falster, Vladimir V. Voronkov, Marco Cornara, Daniela Gambaro | 2015-09-08 |
| 7442253 | Process for forming low defect density, ideal oxygen precipitating silicon | Robert J. Falster, Joseph C. Holzer, Marco Cornara, Daniela Gambaro, Steve A. Markgraf +3 more | 2008-10-28 |
| 7229693 | Low defect density, ideal oxygen precipitating silicon | Robert J. Falster, Joseph C. Holzer, Marco Cornara, Daniela Gambaro, Steve A. Markgraf +3 more | 2007-06-12 |
| 6896728 | Process for producing low defect density, ideal oxygen precipitating silicon | Robert J. Falster, Joseph C. Holzer, Marco Cornara, Daniela Gambaro, Steve A. Markgraf +3 more | 2005-05-24 |
| 6849119 | Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor | Robert J. Falster, Marco Cornara, Daniela Gambaro | 2005-02-01 |
| 6586068 | Ideal oxygen precipitating silicon wafer having an asymmetrical vacancy concentration profile and a process for the preparation thereof | Robert J. Falster, Marco Cornara, Daniela Gambaro | 2003-07-01 |
| 6555194 | Process for producing low defect density, ideal oxygen precipitating silicon | Robert Falster, Joseph C. Holzer, Marco Cornara, Daniela Gambaro, Steve A. Markgraf +3 more | 2003-04-29 |
| 6537368 | Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor | Robert J. Falster, Marco Cornara, Daniela Gambaro | 2003-03-25 |
| 6306733 | Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor | Robert J. Falster, Marco Cornara, Daniela Gambaro | 2001-10-23 |
| 6204152 | Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor | Robert J. Falster, Marco Cornara, Daniela Gambaro | 2001-03-20 |
| 6190631 | Low defect density, ideal oxygen precipitating silicon | Robert Falster, Joseph C. Holzer, Marco Cornara, Daniela Gambaro, Steve A. Markgraf +3 more | 2001-02-20 |
| 6180220 | Ideal Oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor | Robert J. Falster, Marco Cornara, Daniela Gambaro | 2001-01-30 |
| 5994761 | Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor | Robert J. Falster, Marco Cornara, Daniela Gambaro | 1999-11-30 |
| 5403406 | Silicon wafers having controlled precipitation distribution | Robert J. Falster, Giancarlo Ferrero, Graham Fisher, Marco Pagani | 1995-04-04 |
| 5401669 | Process for the preparation of silicon wafers having controlled distribution of oxygen precipitate nucleation centers | Robert J. Falster, Giancarlo Ferrero, Graham Fisher, Marco Pagani | 1995-03-28 |