DG

Daniela Gambaro

MM Memc Electronic Materials: 8 patents #23 of 273Top 9%
MS Memc Electronic Materials S.P.A.: 4 patents #3 of 38Top 8%
SL Sunedison Semiconductor Limited: 1 patents #4 of 43Top 10%
Overall (All Time): #383,824 of 4,157,543Top 10%
13
Patents All Time

Issued Patents All Time

Patent #TitleCo-InventorsDate
9129919 Production of high precipitate density wafers by activation of inactive oxygen precipitate nuclei Robert J. Falster, Vladimir V. Voronkov, Marco Cornara, Massimiliano Olmo 2015-09-08
7442253 Process for forming low defect density, ideal oxygen precipitating silicon Robert J. Falster, Joseph C. Holzer, Marco Cornara, Massimiliano Olmo, Steve A. Markgraf +3 more 2008-10-28
7229693 Low defect density, ideal oxygen precipitating silicon Robert J. Falster, Joseph C. Holzer, Marco Cornara, Massimiliano Olmo, Steve A. Markgraf +3 more 2007-06-12
6896728 Process for producing low defect density, ideal oxygen precipitating silicon Robert J. Falster, Joseph C. Holzer, Marco Cornara, Massimiliano Olmo, Steve A. Markgraf +3 more 2005-05-24
6849119 Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Robert J. Falster, Marco Cornara, Massimiliano Olmo 2005-02-01
6586068 Ideal oxygen precipitating silicon wafer having an asymmetrical vacancy concentration profile and a process for the preparation thereof Robert J. Falster, Marco Cornara, Massimiliano Olmo 2003-07-01
6555194 Process for producing low defect density, ideal oxygen precipitating silicon Robert Falster, Joseph C. Holzer, Marco Cornara, Massimiliano Olmo, Steve A. Markgraf +3 more 2003-04-29
6537368 Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor Robert J. Falster, Marco Cornara, Massimiliano Olmo 2003-03-25
6306733 Ideal oxygen precipitating epitaxial silicon wafers and oxygen out-diffusion-less process therefor Robert J. Falster, Marco Cornara, Massimiliano Olmo 2001-10-23
6204152 Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Robert J. Falster, Marco Cornara, Massimiliano Olmo 2001-03-20
6190631 Low defect density, ideal oxygen precipitating silicon Robert Falster, Joseph C. Holzer, Marco Cornara, Massimiliano Olmo, Steve A. Markgraf +3 more 2001-02-20
6180220 Ideal Oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Robert J. Falster, Marco Cornara, Massimiliano Olmo 2001-01-30
5994761 Ideal oxygen precipitating silicon wafers and oxygen out-diffusion-less process therefor Robert J. Falster, Marco Cornara, Massimiliano Olmo 1999-11-30