NM

Naoto Miyashita

KT Kabushiki Kaisha Toshiba: 39 patents #530 of 21,451Top 3%
EB Ebara: 2 patents #752 of 1,611Top 50%
TO Tokuyama: 2 patents #163 of 562Top 30%
Fujitsu Limited: 1 patents #14,843 of 24,456Top 65%
JS Jsr: 1 patents #649 of 1,137Top 60%
Overall (All Time): #80,165 of 4,157,543Top 2%
40
Patents All Time

Issued Patents All Time

Showing 26–40 of 40 patents

Patent #TitleCo-InventorsDate
5878191 Heat treatment apparatus for semiconductor wafers Ichiro Katakabe, Hiroshi Kawamoto, Kenji Doi, Tsuyoshi Okuda 1999-03-02
5861054 Polishing slurry Masahiro Abe, Mariko Shimomura 1999-01-19
5858859 Semiconductor device having a trench for device isolation fabrication method Koichi Takahashi 1999-01-12
5683908 Method of fabricating trench isolation structure having tapered opening Koichi Takahashi 1997-11-04
5643046 Polishing method and apparatus for detecting a polishing end point of a semiconductor wafer Ichiro Katakabe, Tatsuo Akiyama 1997-07-01
5643406 Chemical-mechanical polishing (CMP) method for controlling polishing rate using ionized water, and CMP apparatus Mariko Shimomura, Hiroyuki Ohashi 1997-07-01
5605488 Polishing apparatus of semiconductor wafer Hiroyuki Ohashi, Ichiro Katakabe, Tetsuya Tsukihara 1997-02-25
5589421 Method of manufacturing annealed films Koichi Takahashi, Mitsutoshi Koyama, Shinji Nunotani, Satoshi Yanagiya, Yoshiro Baba 1996-12-31
5434447 Semiconductor device having a trench for device isolation and method of fabricating the same Koichi Takahashi 1995-07-18
5380399 Method of treating semiconductor substrates Koichi Takahashi, Mitsutoshi Koyama 1995-01-10
5346555 Device for thermal treatment and film forming process Shinji Nunotani, Koichi Takahashi 1994-09-13
5332683 Method of manufacturing semiconductor device having elements isolated by trench Koichi Takahashi, Hironori Sonobe 1994-07-26
5111272 Semiconductor device having element regions electrically isolated from each other Koichi Takahashi, Hironori Sonobe, Mitsutoshi Koyama 1992-05-05
5029554 Semiconductor manufacturing apparatus including a temperature control mechanism Koichi Takahashi, Hiroshi Kinoshita 1991-07-09
4916086 Method of manufacturing a semiconductor device having rounded trench corners Kouichi Takahashi, Hiroshi Kinoshita, Hironori Sonobe 1990-04-10