Issued Patents All Time
Showing 1–25 of 26 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 10984992 | Sputtering target | Shuhei Murata, Kotaro Nagatsu | 2021-04-20 |
| 10576968 | Control system, relay device and control method | Yukitoshi Tsuboi, Yutaka Igaku | 2020-03-03 |
| 10344373 | Process for producing a target formed of a sintering-resistant material of a high-melting point metal alloy, silicide, carbide, nitride or boride | — | 2019-07-09 |
| 9725088 | Control system, relay device and control method | Yukitoshi Tsuboi, Yutaka Igaku | 2017-08-08 |
| 9677170 | Target formed of sintering-resistant material of high-melting point metal alloy, high-melting point metal silicide, high-melting point metal carbide, high-melting point metal nitride, or high-melting point metal boride, process for producing the target, assembly of the sputtering target-backing plate, and process for producing the same | — | 2017-06-13 |
| 9653270 | Method for connecting magnetic substance target to backing plate, and magnetic substance target | Kenichi Mogaki | 2017-05-16 |
| 9249497 | Ni alloy sputtering target, Ni alloy thin film and Ni silicide film | Kazumasa Ohashi | 2016-02-02 |
| 9051645 | Barrier film for semiconductor wiring, sintered compact sputtering target and method of producing the sputtering target | Shinichiro Senda, Junichi Ito | 2015-06-09 |
| 8871144 | High-purity Ni-V alloy target therefrom high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy | Yuichiro Shindo | 2014-10-28 |
| 8318314 | Barrier film for flexible copper substrate and sputtering target for forming barrier film | Shuichi Irumata | 2012-11-27 |
| 8283051 | Plated product having copper thin film formed thereon by electroless plating | Junichi Ito, Atsushi Yabe, Junnosuke Sekiguchi, Toru Imori, Shinichiro Senda | 2012-10-09 |
| 8262816 | Hafnium alloy target | Takeo Okabe, Shuichi Irumata, Hirohito Miyashita, Ryo Suzuki | 2012-09-11 |
| 8241438 | Hafnium alloy target | Takeo Okabe, Shuichi Irumata, Hirohito Miyashita, Ryo Suzuki | 2012-08-14 |
| 8114341 | Nickel alloy sputtering target and nickel silicide film | — | 2012-02-14 |
| 8062440 | Hafnium alloy target and process for producing the same | Takeo Okabe, Shuichi Irumata, Hirohito Miyashita, Ryo Suzuki | 2011-11-22 |
| 7938918 | High-purity Ni-V alloy, target therefrom, high-purity Ni-V alloy thin film and process for producing high-purity Ni-V alloy | Yuichiro Shindo | 2011-05-10 |
| 7740718 | Target of high-purity nickel or nickel alloy and its producing method | Hirohito Miyashita | 2010-06-22 |
| 7618505 | Target of high-purity nickel or nickel alloy and its producing method | Hirohito Miyashita | 2009-11-17 |
| 7605481 | Nickel alloy sputtering target and nickel alloy thin film | Ryo Suzuki | 2009-10-20 |
| 7459036 | Hafnium alloy target and process for producing the same | Takeo Okabe, Shuichi Irumata, Hirohito Miyashita, Ryo Suzuki | 2008-12-02 |
| 7347353 | Method for connecting magnetic substance target to backing plate, and magnetic substance target | Kenichi Mogaki | 2008-03-25 |
| 6858116 | Sputtering target producing few particles, backing plate or sputtering apparatus and sputtering method producing few particles | Takeo Okabe, Hirohito Miyashita | 2005-02-22 |
| 6153315 | Sputtering target and method for manufacturing thereof | Hirohito Miyashita, Kazuhiro Seki | 2000-11-28 |
| 5618397 | Silicide targets for sputtering | Osamu Kano, Junichi Anan, Koichi Yasui | 1997-04-08 |
| 5464520 | Silicide targets for sputtering and method of manufacturing the same | Osamu Kano, Koichi Yasui, Yasuyuki Sato, Junichi Anan, Hironori Wada +1 more | 1995-11-07 |