Issued Patents All Time
Showing 1–19 of 19 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11424140 | Member, method of manufacturing the same, apparatus for manufacturing the same, and semiconductor manufacturing apparatus | Changhwan Kim, Kenichi Nagayama, Takafumi Noguchi | 2022-08-23 |
| 10797060 | Three-dimensional memory device having stressed vertical semiconductor channels and method of making the same | Rahul Sharangpani, Raghuveer S. Makala, Adarsh Rajashekhar, Fei Zhou, Srikanth Ranganathan +1 more | 2020-10-06 |
| 10797061 | Three-dimensional memory device having stressed vertical semiconductor channels and method of making the same | Akio Nishida, Rahul Sharangpani, Raghuveer S. Makala, Adarsh Rajashekhar, Fei Zhou +1 more | 2020-10-06 |
| 10658469 | Semiconductor device including a plurality of nitride semiconductor layers | Shin Koyama, Yoshitake Kato | 2020-05-19 |
| 10115899 | Methods and apparatus for three-dimensional nonvolatile memory | Yusuke Yoshida, Tomohiro Uno, Tomoyuki Obu, Takeki Ninomiya | 2018-10-30 |
| 9443910 | Silicided bit line for reversible-resistivity memory | Kan Fujiwara, Takuya Futase, Shin Kikuchi, Yoichiro Tanaka, Akio Nishida +1 more | 2016-09-13 |
| 8815678 | Method for fabricating a metal-insulator-metal (MIM) capacitor having capacitor dielectric layer formed by atomic layer deposition (ALD) | Tomoe Yamamoto, Mami Toda, Shintaro Yamamichi | 2014-08-26 |
| 8440521 | Method of manufacturing a semiconductor device | Naomi Fukumaki, Eiji Hasegawa, Ichiro Yamamoto | 2013-05-14 |
| 8212299 | Semiconductor device having a thin film capacitor of a MIM (metal-insulator-metal) structure | Tomoe Yamamoto, Mami Toda, Shintaro Yamamichi | 2012-07-03 |
| 8188547 | Semiconductor device with complementary transistors that include hafnium-containing gate insulators and metal gate electrodes | Kenzo Manabe, Daisuke Ikeno | 2012-05-29 |
| 8169013 | Metal-insulator-metal (MIM) capacitor having capacitor dielectric material selected from a group consisting of ZRO2, HFO2, (ZRX, HF1-X)O2 (0| Tomoe Yamamoto, Mami Toda, Shintaro Yamamichi |
2012-05-01 |
|
| 7943475 | Process for manufacturing a semiconductor device comprising a metal-compound film | Tomoe Yamamoto | 2011-05-17 |
| 6875667 | Method for forming capacitor | Tomoe Yamamoto | 2005-04-05 |
| 6602722 | Process for fabricating capacitor having dielectric layer with pervskite structure and apparatus for fabricating the same | Ichiro Yamamoto, Yoshitake Kato | 2003-08-05 |
| 6596602 | Method of fabricating a high dielectric constant metal oxide capacity insulator film using atomic layer CVD | Tomoe Yamamoto | 2003-07-22 |
| 6448597 | DRAM having a stacked capacitor and a method for fabricating the same | Naoki Kasai | 2002-09-10 |
| 6349019 | Magnetic head device with constant head floating height | Yukihito Ito, Shoji Toyoda | 2002-02-19 |
| 6338996 | Semiconductor memory device production method | — | 2002-01-15 |
| 6326258 | Method of manufacturing semiconductor device having thin film capacitor | — | 2001-12-04 |