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Method for fabricating a metal-insulator-metal (MIM) capacitor having capacitor dielectric layer formed by atomic layer deposition (ALD) |
Toshihiro Iizuka, Mami Toda, Shintaro Yamamichi |
2014-08-26 |
| 8304021 |
Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device |
Tomohisa Iino |
2012-11-06 |
| 8212299 |
Semiconductor device having a thin film capacitor of a MIM (metal-insulator-metal) structure |
Toshihiro Iizuka, Mami Toda, Shintaro Yamamichi |
2012-07-03 |
| 8169013 |
Metal-insulator-metal (MIM) capacitor having capacitor dielectric material selected from a group consisting of ZRO2, HFO2, (ZRX, HF1-X)O2 (0
| Toshihiro Iizuka, Mami Toda, Shintaro Yamamichi |
2012-05-01 |
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| 7943475 |
Process for manufacturing a semiconductor device comprising a metal-compound film |
Toshihiro Iizuka |
2011-05-17 |
| 7608502 |
Method for manufacturing semiconductor device |
Tomohisa Iino, Naomi Fukumaki, Yoshitake Kato |
2009-10-27 |
| 7439181 |
Method for processing interior of vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device |
— |
2008-10-21 |
| 7276444 |
Method for processing interior of vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device |
— |
2007-10-02 |
| 6875667 |
Method for forming capacitor |
Toshihiro Iizuka |
2005-04-05 |
| 6596602 |
Method of fabricating a high dielectric constant metal oxide capacity insulator film using atomic layer CVD |
Toshihiro Iizuka |
2003-07-22 |
| 6518142 |
Fabrication method for MIM capacitive circuit having little leakage current |
— |
2003-02-11 |
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Method for manufacturing semiconductor memory and method for manufacturing capacitor |
— |
2002-06-04 |