Issued Patents All Time
Showing 1–25 of 29 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12153338 | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Hiroaki Shishido, Osamu Nozawa | 2024-11-26 |
| 12007684 | Mask blank, method of manufacturing imprint mold, method of manufacturing transfer mask, method of manufacturing reflective mask, and method of manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido | 2024-06-11 |
| 11762279 | Mask blank, method for manufacturing reflective mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido | 2023-09-19 |
| 11630388 | Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido | 2023-04-18 |
| 11435662 | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Hiroaki Shishido, Takashi Uchida | 2022-09-06 |
| 11415875 | Mask blank, phase shift mask, and method for manufacturing semiconductor device | Hitoshi Maeda, Yasutaka HORIGOME | 2022-08-16 |
| 11281089 | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido | 2022-03-22 |
| 11119400 | Mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Hiroaki Shishido, Takashi Uchida | 2021-09-14 |
| 11054735 | Mask blank, phase shift mask, method for manufacturing phase shift mask, and method for manufacturing semiconductor device | Takenori Kajiwara, Hiroaki Shishido, Osamu Nozawa | 2021-07-06 |
| 11022875 | Mask blank, phase shift mask, and method of manufacturing semiconductor device | Kazutake TANIGUCHI, Hitoshi Maeda | 2021-06-01 |
| 11009787 | Mask blank, phase shift mask, and method for manufacturing semiconductor device | Hitoshi Maeda, Yasutaka HORIGOME | 2021-05-18 |
| 10915016 | Mask blank, method for manufacturing phase shift mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido | 2021-02-09 |
| 10571797 | Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido | 2020-02-25 |
| 10527931 | Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido, Yasushi Okubo | 2020-01-07 |
| 10481485 | Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device | Osamu Nozawa, Takenori Kajiwara | 2019-11-19 |
| 10365555 | Mask blank, transfer mask and methods of manufacturing the same | Hiroaki Shishido, Osamu Nozawa | 2019-07-30 |
| 10101650 | Mask blank, transfer mask, method for manufacturing transfer mask, and method for manufacturing semiconductor device | Osamu Nozawa, Hiroaki Shishido, Yasushi Okubo | 2018-10-16 |
| 9952497 | Mask blank and method of manufacturing phase shift mask | Yasushi Okubo | 2018-04-24 |
| 9726972 | Mask blank, transfer mask, and method for manufacturing transfer mask | Hiroaki Shishido, Osamu Nozawa | 2017-08-08 |
| 9625805 | Reflective mask blank, reflective mask and method of manufacturing reflective mask | Kazuya Sakai, Osamu Nozawa, Toshiyuki Suzuki | 2017-04-18 |
| 9494852 | Mask blank and method of manufacturing phase shift mask | Yasushi Okubo | 2016-11-15 |
| 9075315 | Reflective mask blank, reflective mask and method of manufacturing reflective mask | Kazuya Sakai, Osamu Nozawa, Toshiyuki Suzuki | 2015-07-07 |
| 9029048 | Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device | Kazuya Sakai, Osamu Nozawa, Toshiyuki Suzuki | 2015-05-12 |
| 8221941 | Photomask blank manufacturing method and photomask manufacturing method | Toshiyuki Suzuki, Masahiro Hashimoto, Kazunori Ono, Kazuya Sakai | 2012-07-17 |
| 7632612 | Halftone phase shift mask blank, halftone phase shift mask, and method of producing the same | Yuuki Shiota, Osamu Nozawa, Hideaki Mitsui | 2009-12-15 |